- Electron-Cyclotron-Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD)
- Micro-Wave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD)
- Thermal Chemical Vapor Deposition (Thermal-CVD)
- Ion-Beam Sputtering Deposition (IBSD)
- Magnetron Sputtering Deposition (MSD)
- Rapid Thermal Process/Annealing (RTP/RTA)
- Vapor Phase Deposition (VPD)
- Induced-Coupled Plasma-Reactive Ion Etching System (ICP-RIE)
- Metal-Organic Chemical Vapor Deposition (MO-CVD)
